Objavljen članak u časopisu Surfaces and Interfaces

Objavljen članak u časopisu Surfaces and Interfaces
(Impact factor: 4,837, JCR 2020):

Ales Omerzu, Robert Peter, Daria Jardas, Iztok Turel, Kresimir Salamon, Matejka Podlogar, Damjan Vengust, Ivana Jelovica Badovinac, Ivna Kavre Piltaver, Mladen Petravic, Large enhancement of photocatalytic activity in ZnO thin films grown by plasma-enhanced atomic layer deposition

https://www.sciencedirect.com/science/article/abs/pii/S2468023021000614

Abstract:
In this work, we present a large, tenfold enhancement in the photocatalytic activity of thin ZnO films grown by plasma-enhanced atomic layer deposition (PE-ALD) at 100 °C, compared to values obtained for thin ZnO films deposited by a conventional thermal ALD method at the same temperature. Thus, we have demonstrated that we can deposit thin ZnO films using the PE-ALD method both at low temperatures and with a high photocatalytic ability. A number of structural (SEM, EDX, HRTEM, GIXRD, XRR, XPS, SIMS) and optical (UV-Vis, PL) experimental techniques have been employed to elucidate a possible physical origin of the observed remarkable difference in the photocatalytic activity of thin ZnO films grown by the PE-ALD method compared to those grown by the thermal ALD method.